Superiority
Purity Grade customized
Formula CHF3
Application
CHF3 is used in the semiconductor industry in plasma etching of silicon oxide and silicon …
Details
Purity Grade customized
Formula CHF3
Application
CHF3 is used in the semiconductor industry in plasma etching of silicon oxide and silicon nitride. Known as R-23 or HFC-23, it is also a useful refrigerant, sometimes as a replacement for Chlorotrifluoromethane (cfc-13) and is a byproduct of its manufacture.
Molecular Weight 70.01g /mol
Alternative name Fluoroform, Carbon trifluoride, Methyl trifluoride, Fluoryl, Freon 23, Arcton 1, HFC 23, R-23, FE-13, UN 1984
Package N/A